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Summary: Rigorous FEM-Simulation of
Maxwell's Equations for
EUV-Lithography
Diplomarbeit
Jan Pomplun
angefertigt am
Konrad Zuse Institut
bei
PD Dr. Frank Schmidt PD Dr. J¨org Liesen
Januar 2006
Contents
1 Introduction 2
2 Background 7
2.1 Theoretical electrodynamics . . . . . . . . . . . . . . . . . . . 7
2.1.1 Maxwell's equations . . . . . . . . . . . . . . . . . . . 7
2.1.2 Constitutive equations . . . . . . . . . . . . . . . . . . 8
2.1.3 Boundary conditions at the interface of two media . . . 8
2.1.4 Reflection and refraction at an interface . . . . . . . . 9
2.1.5 Propagation of light in a multilayer stack . . . . . . . . 10
2.1.6 Time harmonic Maxwell's equations . . . . . . . . . . . 14
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