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PHYSICAL REVIEW B 84, 214108 (2011) Time-resolved measurements of nanoscale surface pattern formation kinetics in two dimensions
 

Summary: PHYSICAL REVIEW B 84, 214108 (2011)
Time-resolved measurements of nanoscale surface pattern formation kinetics in two dimensions
on ion-irradiated Si
Eitan Anzenberg,1,*
Charbel S. Madi,2
Michael J. Aziz,2
and Karl F. Ludwig Jr.1
1
Department of Physics, Boston University, Boston, Massachusetts 02215, USA
2
Harvard School of Engineering and Applied Sciences, Cambridge, Massachusetts 02138, USA
(Received 27 July 2011; revised manuscript received 22 November 2011; published 19 December 2011)
The nanoscale kinetics of surface topography evolution on silicon surfaces irradiated with 1 keV Ar+
ions
is examined in both directions perpendicular and parallel to the projection of the ion beam on the surface. We
use grazing incidence small angle x-ray scattering to measure in situ the evolution of surface morphology via
the linear dispersion relation. We study the transition from surface ultra-smoothening at low angles of deviation
from normal ion incidence to a pattern-forming instability at high incidence angles. A model based on the
effects of impact-induced redistribution of those atoms that are not sputtered away explains both the observed
ultra-smoothening at low angles from normal ion incidence and the instability at higher angles and accounts

  

Source: Aziz, Michael J.- School of Engineering and Applied Sciences, Harvard University

 

Collections: Physics; Materials Science