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Chapter Number1 Laser Patterning Utilizing Masked2
 

Summary: Chapter Number1
Laser Patterning Utilizing Masked2
Buffer Layer3
Ori Stein and Micha Asscher4
Institute of Chemistry and the Farkas Center for light5
induced processes, The Hebrew University of Jerusalem6
Israel7
1. Introduction8
Laser-matter interaction has been the focus of intense research over the past three decades9
with diverse applications in the semiconductor industry (photolithography), sensing and10
analytical chemistry in general. Pulsed laser ablation of adsorbates under well controlled11
ultra high vacuum (UHV) conditions has enabled detection in the gas phase of large (mostly12
biologically important) molecules via mass spectrometry, but also to study the remaining13
species on the surface. In this chapter we will focus our report on these remaining atoms14
and molecules following selective laser ablation of weakly bound buffer layers as a novel15
tool for patterning of adsorbates on solid surfaces.16
1.1 Patterning of adsorbates for diffusion measurements17
Laser Induced Thermal Desorption (LITD) of adsorbates has developed as an important18
technique for surface diffusion measurements. In the hole-refilling method, a hole was burnt19
within an adsorbate covered surface. Subsequent time delayed laser pulse was employed to20

  

Source: Asscher, Micha - Institute of Chemistry, Hebrew University of Jerusalem

 

Collections: Chemistry