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PROOF COPY [BY10021] 059708PRB [BY10021]059708PRB

Summary: PROOF COPY [BY10021] 059708PRB
Kinetic energy effects on morphology evolution during pulsed laser deposition
of metal-on-insulator films
Jeffrey M. Warrender* and Michael J. Aziz
Division of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA
Received 2 November 2006; revised manuscript received 29 December 2006
We report an experimental comparison of Volmer-Weber metal-on-insulator growth morphology in pulsed
laser deposition PLD and thermal deposition under identical thermal, background, and surface preparation
conditions for Ag on SiO2 and mica. Films exhibit a characteristic morphological progression from isolated
three-dimensional islands to elongated clusters to a percolating, electrically conducting film to a pinhole-free
film. We observed this same progression for films deposited by PLD. Kinetic Monte Carlo KMC simulations
that take into account only the pulsed nature of the flux predict that PLD films should advance to percolation
with less deposition than thermally deposited films under otherwise identical conditions. At low substrate
temperatures, this prediction is confirmed. However, in situ resistance measurements and ex situ atomic force
microscopy measurements demonstrate that at high substrate temperatures, PLD films require more deposition
to reach percolation. PLD experiments performed at varying kinetic energy of the depositing Ag species
suggest a regime in which increasing kinetic energy can delay the percolation transition. Comparison was made


Source: Aziz, Michael J.- School of Engineering and Applied Sciences, Harvard University


Collections: Physics; Materials Science