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ECR-Etching of Submicron and Nanometer Sized 3C-SiC(100) Mesa Lars Hiller1,a
 

Summary: ECR-Etching of Submicron and Nanometer Sized 3C-SiC(100) Mesa
Structures
Lars Hiller1,a
, Thomas Stauden1,b
, Ricarda M. Kemper2,c
, Jörg K. N. Lindner2,d
,
Donat J. As2,e
and Jörg Pezoldt1,f
1
FG Nanotechnologie, Institut für Mikro- und Nanotechnologien MacroNano®
, Technische
Universität Ilmenau, Postfach 100565, 98684 Ilmenau, Germany
2
Department Physik, Universität Paderborn, Warburgerstraße 100, 33098 Paderborn, Germany
a
lars.hiller@tu-ilmenau.de, b
thomas.stauden@tu-ilmenau.de, c
rkemper@mail.uni-paderborn.de,
d

  

Source: As, Donat Josef - Department Physik, Universität Paderborn

 

Collections: Materials Science; Physics