Home

About

Advanced Search

Browse by Discipline

Scientific Societies

E-print Alerts

Add E-prints

E-print Network
FAQHELPSITE MAPCONTACT US


  Advanced Search  

 
Reduced surface roughness of solid thin films prepared by alternating-bias,
 

Summary: Reduced surface roughness of solid thin films
prepared by alternating-bias,
radio-frequency magnetron sputtering
Rabi Rabady and Ivan Avrutsky
Department of Electrical and Computer Engineering, Wayne State University, Detroit, Michigan 48202
Received November 21, 2002; revised manuscript received May 2, 2003
Surface roughness that is associated with thin-film deposition has a direct effect on the optical, electrical, and
mechanical quality of solid-thin-film devices. The effect of using alternating bias during rf-magnetron sput-
tering of SiO2 on Si substrate was investigated, and it was proven experimentally that modulating the plasma
flow by means of alternating bias produces more even deposition of the sputtered material. This effect was
verified by analyzing the envelope of the reflection fringes that were recorded during the thin-film deposition
process, and by observing the power reduction in the arc-shaped scattering that is associated with mode exci-
tation of a rough-surface waveguide. 2003 Optical Society of America
OCIS codes: 240.6700, 240.5770, 310.1860, 350.5400.
1. INTRODUCTION
Surface roughness that is associated with thin-film depo-
sition has a direct effect on the performance of solid-thin-
film devices. For thin films that are prepared for optical
waveguides, multilayer interference filters, and optical
resonant filters, surface roughness becomes a significant

  

Source: Avrutsky, Ivan - Department of Electrical and Computer Engineering, Wayne State University

 

Collections: Engineering