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A Systematic Study of the Formation of Nano-Tips on Silicon Thin Films by Excimer Laser Irradiation
 

Summary: A Systematic Study of the Formation of Nano-Tips on Silicon Thin Films by Excimer Laser
Irradiation
D.G. Georgiev, R.J. Baird, I. Avrutsky, G. Auner, G. Newaz1
, N. Tokranova2
Department of Electrical and Computer Engineering, Wayne State University, Detroit, MI 48202
1
Department of Mechanical Engineering, Wayne State University, Detroit, MI 48202
2
Institute for Materials, SUNY at Albany, Albany, NY 12203
ABSTRACT
Recently, we reported conditions for controllable, direct laser fabrication of sharp conical
tips with heights of about one micrometer and apical radii of curvature of several tens of
nanometers. An individual cone is formed when a single-crystal silicon film on an insulator
substrate is irradiated in air environment with a single pulse from a KrF excimer laser,
homogenized and shaped to a circular spot several microns in diameter. In this work, we present
a study of the formation of such tips as a function of the laser fluence, the film thickness, and the
diameter of the irradiated spot. Atomic force microscopy and scanning electron microscopy were
used to study the topography of the structures. A simple mechanism of formation based on
movement of melted material is proposed. We have also studied structures (nano-ridges) that
resulted from irradiation with narrow lines (width of several microns) instead of circular spots.

  

Source: Avrutsky, Ivan - Department of Electrical and Computer Engineering, Wayne State University

 

Collections: Engineering