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Surface Science 450 (2000) 5163 www.elsevier.nl/locate/susc
 

Summary: Surface Science 450 (2000) 5163
www.elsevier.nl/locate/susc
Kinetic lattice Monte Carlo simulation of facet growth rate
Zhiyong Wang a,*, Youhong Li b, James B. Adams a,b
a Science and Engineering of Materials Program, Arizona State University, Tempe, AZ 85287-1704, USA
b Department of Chemical, Bio and Materials Engineering, Arizona State University, Tempe, AZ 85287-6006, USA
Received 7 May 1999; accepted for publication 7 October 1999
Abstract
We present a kinetic lattice Monte Carlo simulation model that describes deposition, surface self-diffusion (including
single adatom, dimer and ledge adatom diffusion), nucleation and film growth on fcc metal substrates. The activation
energies for diffusion are calculated using the embedded-atom method. Using this model, we determine the relative
growth rates of (100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size.
The effects of relative growth rates on the microstructural evolution of Cu films are discussed. 2000 Elsevier Science
B.V. All rights reserved.
Keywords: Adatoms; Copper; Diffusion and migration; Growth; Metallic films; Models of surface kinetics; Monte Carlo simulations;
Surface diffusion
1. Introduction oriented grains are frequently observed [2,3].
Experiments by Ryu et al. have shown that the
electromigration lifetime of (111)-textured CuAs devices are scaled down to submicrometer
dimensions, switching speed and power consump- films is about four times longer than that of (100)-

  

Source: Adams, James B - Department of Chemical and Materials Engineering, Arizona State University

 

Collections: Materials Science