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Deposition of WNxCy Using the Allylimido Complexes Cl4,,RCN...W,,NC3H5...: Effect of NH3 on Film Properties
 

Summary: Deposition of WNxCy Using the Allylimido Complexes
Cl4,,RCN...W,,NC3H5...: Effect of NH3 on Film Properties
Hiral M. Ajmera,a,
* Andrew T. Heitsch,a
Omar J. Bchir,a
David P. Norton,c,
*
Laurel L. Reitfort,b
Lisa McElwee-White,b,z
and Timothy J. Andersona,
*,z
a
Department of Chemical Engineering, b
Department of Chemistry, and c
Department of Materials Science
and Engineering, University of Florida, Gainesville, Florida 32611, USA
A mixture of the tungsten allylimido complexes Cl4 RCN W NC3H5 1a, R = CH3; 1b, R = Ph was used to deposit tungsten
nitride carbide WNxCy films with ammonia as coreactant. Depositions were done in a chemical vapor deposition reactor at
temperatures in the range of 450750C. The effect of ammonia on film composition, crystallinity, lattice parameter, grain size,
film growth rate, and electrical resistivity was studied. Importantly, films grown at 450C with ammonia as a coreactant were

  

Source: Anderson, Timothy J. - Chemical Engineering Department, University of Florida

 

Collections: Materials Science