Summary: Deposition of WNxCy Using the Allylimido Complexes
Cl4,,RCN...W,,NC3H5...: Effect of NH3 on Film Properties
Hiral M. Ajmera,a,
* Andrew T. Heitsch,a
Omar J. Bchir,a
David P. Norton,c,
*
Laurel L. Reitfort,b
Lisa McElwee-White,b,z
and Timothy J. Andersona,
*,z
a
Department of Chemical Engineering, b
Department of Chemistry, and c
Department of Materials Science
and Engineering, University of Florida, Gainesville, Florida 32611, USA
A mixture of the tungsten allylimido complexes Cl4 RCN W NC3H5 1a, R = CH3; 1b, R = Ph was used to deposit tungsten
nitride carbide WNxCy films with ammonia as coreactant. Depositions were done in a chemical vapor deposition reactor at
temperatures in the range of 450­750°C. The effect of ammonia on film composition, crystallinity, lattice parameter, grain size,
film growth rate, and electrical resistivity was studied. Importantly, films grown at 450°C with ammonia as a coreactant were

Source: Anderson, Timothy J. - Chemical Engineering Department, University of Florida

Collections: Materials Science