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Thermal calibration of photodiode sensitivity for atomic force microscopy Phil Attarda
 

Summary: Thermal calibration of photodiode sensitivity for atomic force microscopy
Phil Attarda
School of Chemistry F11, University of Sydney, NSW 2006 Australia
Torbjörn Pettersson and Mark W. Rutland
Department of Chemistry, Royal Institute of Technology, SE-100 44 Stockholm, Sweden
and Institute for Surface Chemistry, Box 5607, SE-114 86 Stockholm, Sweden
Received 21 June 2006; accepted 9 October 2006; published online 21 November 2006
The photodiode sensitivity in the atomic force microscope is calibrated by relating the voltage noise
to the thermal fluctuations of the cantilever angle. The method accounts for the ratio of the thermal
fluctuations measured in the fundamental vibration mode to the total, and also for the tilt and
extended tip of the cantilever. The method is noncontact and is suitable for soft or deformable
surfaces where the constant compliance method cannot be used. For hard surfaces, the method can
also be used to calibrate the cantilever spring constant. © 2006 American Institute of Physics.
DOI: 10.1063/1.2387891
Force measurement with the atomic force microscope
AFM requires the sensitivity of the photodiode, which re-
lates its change in voltage to the change in position of the tip
of the cantilever, i.e.,
0 z/ V. 1
While alternatives exist,1­4

  

Source: Attard, Phil - School of Chemistry, University of Sydney

 

Collections: Chemistry