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Optical properties of Al2O3 thin films grown by atomic layer deposition
 

Summary: Optical properties of Al2O3 thin films
grown by atomic layer deposition
Pradeep Kumar,1,
* Monika K. Wiedmann,2
Charles H. Winter,2
and Ivan Avrutsky1
1
Electrical and Computer Engineering, 5050 Anthony Wayne Drive, Wayne State University,
Detroit, Michigan 48202, USA
2
Department of Chemistry, 5101 Cass Avenue, Wayne State University,
Detroit, Michigan 48202, USA
*Corresponding author: du9935@wayne.edu
Received 18 May 2009; revised 14 August 2009; accepted 11 September 2009;
posted 15 September 2009 (Doc. ID 109791); published 25 September 2009
We employed the atomic layer deposition technique to grow Al2O3 films with nominal thicknesses of 400,
300, and 200 nm on silicon and soda lime glass substrates. The optical properties of the films were in-
vestigated by measuring reflection spectra in the 4001800 nm wavelength range, followed by numerical
fitting assuming the Sellmeier formula for the refractive index of Al2O3. The films grown on glass sub-
strates possess higher refractive indices as compared to the films on silicon. Optical waveguiding is

  

Source: Avrutsky, Ivan - Department of Electrical and Computer Engineering, Wayne State University

 

Collections: Engineering