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Summary: Vol. 14, No. 7, pp. 18, 2001 1
*
Multivariable System Identification Experiments for
Semiconductor Exposure Apparatus Supported by
Anti-Vibration Units Using Subspace Method*
Hiroyuki Takanashi
, Hiroaki Kato
, Atsushi Toukairin
, Takehiko Mayama
,
Shinji Wakui
and Shuichi Adachi
In this paper, multi-degrees-of-freedom (multi-DOF) system identification of semiconductor ex-
posure apparatus supported by anti-vibration units is discussed. To meet nanometer order semicon-
ductor lithography demands for alignment accuracy, vibration control is one of the most important
technologies in the semiconductor exposure apparatus supported by anti-vibration units. A dynam-
ical model of the plant is necessary in order to design the microvibration controller and to evaluate
the performance of the control systems. The controlled object is essentially a multivariable system,
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