Home

About

Advanced Search

Browse by Discipline

Scientific Societies

E-print Alerts

Add E-prints

E-print Network
FAQHELPSITE MAPCONTACT US


  Advanced Search  

 
Single pulse excimer laser nanostructuring of thin silicon films: Nanosharp cones formation and a heat transfer problem
 

Summary: Single pulse excimer laser nanostructuring of thin silicon films:
Nanosharp cones formation and a heat transfer problem
Julia Eizenkop,a
Ivan Avrutsky, and Gregory Aunerb
Department of Electrical and Computer Engineering, Wayne State University, Detroit, Michigan 48202
Daniel G. Georgiev
Department of Electrical Engineering and Computer Science, University of Toledo,
Toledo, Ohio 43606-3390
Vipin Chaudhary
Department of Computer Science and Engineering, The State University of New York,
Buffalo, New York 14260
Received 6 December 2006; accepted 23 December 2007; published online 3 May 2007
We present analytical and computer modeling along with an experiment on the formation of sharp
conical tips on monocrystalline silicon thin films, silicon-on-insulator, subjected to irradiation by
single 25 ns pulses from a KrF excimer laser focused into a spot several micrometers in diameter.
These fabricated structures have heights of about 1 m and apical radii of curvature of several tens
of nanometers. We offer a simplified analytical model for the formation of these structures. The
computer simulation includes two-dimensional time-dependant heat transfer and phase
transformations in Si films on SiO2 substrates that result from the laser irradiation the Stefan
problem . It is shown that upon irradiation and initial melting, the liquid/solid interface remains

  

Source: Avrutsky, Ivan - Department of Electrical and Computer Engineering, Wayne State University

 

Collections: Engineering