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Process method to suppress the effect of phase errors in alternating phase shift masks
 

Summary: Process method to suppress the effect of phase errors in alternating phase
shift masks
Navab Singha
Institute of Microelectronics, 11 Science Park Road, Singapore Science Park II, Singapore 117685
and Department of Electrical and Computer Engineering, National University of Singapore,
4 Engineering Drive 3, Singapore 117576
Moitreyee M. Roy and Sohan S. Mehta
Institute of Microelectronics, 11 Science Park Road, Singapore Science Park II, Singapore 117685
A. O. Adeyeye
Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering
Drive 3, Singapore 117576
Received 25 October 2004; accepted 14 February 2005; published 18 March 2005
We have developed a process method to suppress the effect of phase errors in alternating phase shift
masks. Our method uses double exposure at reversed focus offsets to nullify the intensity imbalance
caused by the phase errors. We have evaluated our technique using 120 nm half-pitch line space
patterns and found it very successful with remarkable improvement in usable depth of focus without
loosing exposure latitude. We also observed that our technique could bring immunity against the
lens aberrations such as defocus and astigmatism. 2005 American Vacuum Society.
DOI: 10.1116/1.1885012
I. INTRODUCTION

  

Source: Adeyeye, Adekunle - Department of Electrical and Computer Engineering, National University of Singapore

 

Collections: Physics; Materials Science