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Journal of Crystal Growth 279 (2005) 521530 Investigation of mass transport phenomena in an upflow
 

Summary: Journal of Crystal Growth 279 (2005) 521530
Investigation of mass transport phenomena in an upflow
cold-wall CVD reactor by gas phase Raman
spectroscopy and modeling
Jang Y. Hwanga
, Chinho Parkb
, Min Huanga
, Tim Andersona,
a
Department of Chemical Engineering, University of Florida, 300 Weil Hall, Gainesville, FL 32611, USA
b
Yeungnam University, School of Chemical Engineering and Technology, Gyeongsan 712-749, Republic of Korea
Received 15 February 2005; accepted 16 February 2005
Available online 9 April 2005
Communicated by J.J. Derby
Abstract
Steady and transient mass transport phenomena within an inverted, stagnation-flow, cold-wall CVD reactor were
investigated by observing the concentration of a tracer species (CH4) with in situ Raman spectroscopy. The transient
studies revealed that the use of matched reactor inlet velocities is crucial to minimize recirculating flow patterns and that
the magnitude of the gas velocity is also important in gas switching. In the steady-state studies, it was observed that the

  

Source: Anderson, Timothy J. - Chemical Engineering Department, University of Florida

 

Collections: Materials Science