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Integrated Ferroelectrics, 83: 6780, 2006 Copyright Taylor & Francis Group, LLC
 

Summary: Integrated Ferroelectrics, 83: 6780, 2006
Copyright Taylor & Francis Group, LLC
ISSN 1058-4587 print / 1607-8489 online
DOI: 10.1080/10584580600949089
Polarization Variations Due to Dislocation
Configurations in Heteroepitaxial
Ferroelectric Layers
I. B. Misirlioglu, G. Akcay, and S. P. Alpay
Department of Materials Science & Engineering and Institute of Materials Science,
University of Connecticut, Storrs, CT 06269, USA
ABSTRACT
Dislocation networks in epitaxial ferroelectric thin films consist of misfit and threading
dislocations. They usually form at high temperatures during film growth when the film is
paraelectric. Once the film becomes ferroelectric upon cooling, they induce spatial polar-
ization gradients which are detrimental to the desired properties. This study analyzes the
ways in which they affect the ferroelectric properties. A qualitative comparison is made
using thermodynamic and electrostatic analysis concluding that the misfit segments of
dislocations are more detrimental than the threading segments.
Keywords: Ferroelectric thin films; dislocations; thickness effects; thermodynamics;
electrostatics

  

Source: Alpay, S. Pamir - Department of Materials Science and Engineering, University of Connecticut

 

Collections: Materials Science