Summary: Journal of Crystal Growth 249 (2003) 262­274
MOCVD of tungsten nitride (WNx) thin films from the imido
complex Cl4(CH3CN)W(Ni
Pr)
Omar J. Bchira
, Steven W. Johnstona
, Amalia C. Cuadraa
, Timothy
J. Andersona,
*,1
, Carlos G. Ortizb
, Benjamin C. Brooksb
, David H. Powellb
,
Lisa McElwee-Whiteb,
*,2
a
Department of Chemical Engineering, University of Florida, P.O. Box 116005, Gainesville, FL 32611, USA
b
Department of Chemistry, University of Florida, Gainesville, FL 32611-7200, USA

Source: Anderson, Timothy J. - Chemical Engineering Department, University of Florida

Collections: Materials Science