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Effect of Methyl Methacrylate/Polyhedral Oligomeric Silsesquioxane Random Copolymers in Compatibilization of Polystyrene and
 

Summary: Effect of Methyl Methacrylate/Polyhedral Oligomeric Silsesquioxane
Random Copolymers in Compatibilization of Polystyrene and
Poly(methyl methacrylate) Blends
Wenhua Zhang, Bruce X. Fu, Y. Seo, Eric Schrag, B. Hsiao, Patrick T. Mather,
Nan-Loh Yang,| Dayi Xu,| Harald Ade, Miriam Rafailovich,*, and
Jonathan Sokolov
Department of Materials Science and Engineering, SUNY, Stony Brook, New York 11794;
Chemistry Department, SUNY, Stony Brook, New York 11794; Institute of Material Science,
University of Connecticut, Storrs, Connecticut 06269; Chemistry Department, CUNY,
Staten Island, New York 10314; and Department of Physics, North Carolina State University,
Raleigh, North Carolina 27695
Received May 13, 2002
ABSTRACT: Random copolymers of methyl methacrylate with polyhedral oligomeric silsesquioxane
(POSS) were synthesized and blended with PS and PMMA homopolymer thin films. The effects of the
POSS on phase segregation were studied using a variety of complementary techniques. The results showed
that these copolymers were efficient at compatibilizing immiscible polymer blends. Compatibilization
occurred when the POSS was grafted onto the backbone and a favorable interaction existed between the
POSS functional groups and the PS homopolymers. The consequences of this compatibilization were
studied using a comprehensive array of characterization methods and found to be as follows: reduced
domain size, increased interfacial width, and greatly improved fracture toughness. This compatibilization

  

Source: Ade, Harald W.- Department of Physics, North Carolina State University
Mather, Patrick T. - Department of Biomedical and Chemical Engineering, Syracuse University

 

Collections: Materials Science; Physics