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Dynamics of pattern formation during low-energy ion bombardment of Si(0 0 1)
 

Summary: Dynamics of pattern formation during low-energy
ion bombardment of Si(0 0 1)
Eric Chason a,*, Jonah Erlebacher b
, Michael J. Aziz b
, J.A. Floro c
, M.B. Sinclair c
a
Division of Engineering, Brown University, Providence, RI, USA
b
Harvard University, Cambridge, MA, USA
c
Sandia National Laboratories, Albuquerque, NM, USA
Abstract
Sputtering of surfaces by collimated, low-energy ion beams results in spontaneous pattern formation in many
systems. In order to explore the mechanisms that control the pattern formation, we have used in situ light scat-
tering to measure the evolution of sputtered Si(0 0 1) surfaces. The results are interpreted within a linear instability
model originally proposed by R.M. Bradley and J.M.E. Harper [J. Vac. Sci. Technol. A 6 (1988) 2390] that
includes the dependence of the sputter yield on the local surface morphology. 2001 Elsevier Science B.V. All
rights reserved.
1. Introduction

  

Source: Aziz, Michael J.- School of Engineering and Applied Sciences, Harvard University

 

Collections: Physics; Materials Science