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DOI: 10.1007/s003390201320 Appl. Phys. A 76, 177182 (2003)

Summary: DOI: 10.1007/s003390201320
Appl. Phys. A 76, 177­182 (2003)
Materials Science & Processing
Applied Physics A
g. appel1
h. ade1,
a.g. guerek2
s. stadler3,
r.p. mikalo4
d. schmeißer4
Orientation studies of Si-phthalocyanine
sulfonic acids cast on SiOx substrates
1 Department of Physics, NCSU, Raleigh, NC 27695, USA
2 TUBITAK-Marmara Research Center, Department of Chemistry, P.O. Box 21, 41470 Gebze-Kocaeli, Turkey
3 Naval Research Laboratory, Materials Physics Branch, Washington, DC 20375, USA
4 Brandenburgische Technische Universität Cottbus, Angewandte Physik-Sensorik, P.O. Box 101344,
03013 Cottbus, Germany
Received: 16 January 2002/Accepted: 11 February 2002
Published online: 3 May 2002 · © Springer-Verlag 2002
ABSTRACT Layers of dihydroxy silicon phthalocyanine tetra-


Source: Ade, Harald W.- Department of Physics, North Carolina State University


Collections: Physics