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pubs.acs.org/MacromoleculesPublished on Web 08/06/2010r 2010 American Chemical Society Macromolecules 2010, 43, 72617268 7261
 

Summary: pubs.acs.org/MacromoleculesPublished on Web 08/06/2010r 2010 American Chemical Society
Macromolecules 2010, 43, 72617268 7261
DOI: 10.1021/ma1009534
Block Copolymer at Nano-Patterned Surfaces
Xingkun Man,
David Andelman,*,
and Henri Orland

Raymond and Beverly Sackler School of Physics and Astronomy, Tel Aviv University, Ramat Aviv 69978, Tel Aviv,
Israel, and
Institut de Physique Theorique, CEA-Saclay, F-91191 Gif-sur-Yvette Cedex, France
Received May 3, 2010; Revised Manuscript Received June 29, 2010
ABSTRACT: We present numerical calculations of lamellar phases of block copolymers at patterned
surfaces. We model symmetric diblock copolymer films forming lamellar phases and the effect of geometrical
and chemical surface patterning on the alignment and orientation of lamellar phases. The calculations are
done within self-consistent field theory (SCFT), where the semi-implicit relaxation scheme is used to solve the
diffusion equation. Two specific setups, motivated by recent experiments, are investigated. In the first,
the film is placed on top of a surface imprinted with long chemical stripes. The stripes interact more favorably
with one of the two blocks and induce a perpendicular orientation in a large range of system parameters.
However, the system is found to be sensitive to its initial conditions and sometimes gets trapped into a

  

Source: Andelman, David - School of Physics and Astronomy, Tel Aviv University

 

Collections: Materials Science; Physics