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Optimized process for the fabrication of mesoscopic magnetic structures A. O. Adeyeye,a),b)
 

Summary: Optimized process for the fabrication of mesoscopic magnetic structures
A. O. Adeyeye,a),b)
J. A. C. Bland, C. Daboo, D. G. Hasko, and H. Ahmed
Cavendish Laboratory, Madingley Road, Cambridge CB3 0HE, United Kingdom
Received 25 November 1996; accepted for publication 31 March 1997
We have used the advantage of the high etch selectivity between metals in a wet etching process to
develop an optimized technique for engineering magnetic materials. This method is based on
electron beam lithography and optimized pattern transfer by a combination of dry and wet etching.
The technique has been used in fabricating mesoscopic Ni80Fe20 dots and wires with lateral
dimensions down to 0.2 m. We have used scanning electron microscopy to verify the lateral sizes
and edge acuity of the structures. The magnetic properties were characterized using magneto-optic
Kerr effect and magnetoresistance measurements. A marked increase in the coercive field and the
saturation field is seen as the width of the wire is decreased. The magnetoresistance change ( R) is
found to increase significantly as the width of the wire is decreased. 1997 American Institute of
Physics. S0021-8979 97 02913-7
INTRODUCTION
The application of lithographic and other controlled fab-
rication techniques has recently given rise to the possibility
of exploring magnetism in laterally controlled magnetic sub-
micron structures with novel magnetic properties associated

  

Source: Adeyeye, Adekunle - Department of Electrical and Computer Engineering, National University of Singapore

 

Collections: Physics; Materials Science