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IOP PUBLISHING JOURNAL OF PHYSICS D: APPLIED PHYSICS J. Phys. D: Appl. Phys. 41 (2008) 153001 (29pp) doi:10.1088/0022-3727/41/15/153001
 

Summary: IOP PUBLISHING JOURNAL OF PHYSICS D: APPLIED PHYSICS
J. Phys. D: Appl. Phys. 41 (2008) 153001 (29pp) doi:10.1088/0022-3727/41/15/153001
TOPICAL REVIEW
Large area patterned magnetic
nanostructures
A O Adeyeye1
and N Singh1,2
1
Department of Electrical and Computer Engineering, National University of Singapore, Singapore
2
Institute of Microelectronics, A*STAR, Singapore
E-mail: eleaao@nus.edu.sg (A O Adeyeye)
Received 2 February 2008, in final form 1 May 2008
Published 18 July 2008
Online at stacks.iop.org/JPhysD/41/153001
Abstract
Magnetic nanostructures are attracting considerable interest due to their unique properties and
potential applications. There are various challenges associated with the fabrication of highly
ordered large area magnetic nanostructures and the understanding of their magnetization
reversal processes. This review focuses on the use of the deep ultraviolet lithography

  

Source: Adeyeye, Adekunle - Department of Electrical and Computer Engineering, National University of Singapore

 

Collections: Physics; Materials Science