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Warrender & Aziz, Pg. 1 Effect of Deposition Rate on Morphology Evolution of Metal-on-Insulator
 

Summary: Warrender & Aziz, Pg. 1
Effect of Deposition Rate on Morphology Evolution of Metal-on-Insulator
Films Grown by Pulsed Laser Deposition
Jeffrey M. Warrender1, 2
& Michael J. Aziz1
1
Harvard School of Engineering and Applied Sciences, 29 Oxford St, Cambridge MA 02138
2
U.S. Army Benét Laboratories, 1 Buffington St, Watervliet NY 12180.
Electronic Mail: jwarrend@post.harvard.edu
Abstract
Ag films were grown by pulsed laser deposition on insulating SiO2 and mica substrates
and exhibited a morphological progression beginning with nucleation of 3D islands and
culminating in a continuous, electrically conducting film. The rate of advancement through this
progression with increasing pulse frequency was studied with experiments and with Kinetic
Monte Carlo simulations. Experiments at 93°C and 135°C give exponents of ­0.34 and ­0.31,
respectively, for the scaling of the electrical percolation thickness with pulse frequency.
Simulations predicted an exponent of ­0.34, in excellent agreement with the experiments. Both
of these values agree well with the previously reported analytic value of ­0.33 for the scaling of
the morphology transition thickness with average flux in continuous deposition. Simulations

  

Source: Aziz, Michael J.- School of Engineering and Applied Sciences, Harvard University

 

Collections: Physics; Materials Science