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Summary: Warrender & Aziz, Pg. 1
Effect of Deposition Rate on Morphology Evolution of Metal-on-Insulator
Films Grown by Pulsed Laser Deposition
Jeffrey M. Warrender1, 2
& Michael J. Aziz1
1
Harvard School of Engineering and Applied Sciences, 29 Oxford St, Cambridge MA 02138
2
U.S. Army Benét Laboratories, 1 Buffington St, Watervliet NY 12180.
Electronic Mail: jwarrend@post.harvard.edu
Abstract
Ag films were grown by pulsed laser deposition on insulating SiO2 and mica substrates
and exhibited a morphological progression beginning with nucleation of 3D islands and
culminating in a continuous, electrically conducting film. The rate of advancement through this
progression with increasing pulse frequency was studied with experiments and with Kinetic
Monte Carlo simulations. Experiments at 93°C and 135°C give exponents of 0.34 and 0.31,
respectively, for the scaling of the electrical percolation thickness with pulse frequency.
Simulations predicted an exponent of 0.34, in excellent agreement with the experiments. Both
of these values agree well with the previously reported analytic value of 0.33 for the scaling of
the morphology transition thickness with average flux in continuous deposition. Simulations
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