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Appl Phys A (2010) 101: 4146 DOI 10.1007/s00339-010-5792-z
 

Summary: Appl Phys A (2010) 101: 4146
DOI 10.1007/s00339-010-5792-z
Nanoscale ablation through optically trapped microspheres
Romain Fardel Euan McLeod Yu-Cheng Tsai
Craig B. Arnold
Received: 25 February 2010 / Accepted: 27 April 2010 / Published online: 15 June 2010
Springer-Verlag 2010
Abstract The ability to directly create patterns with size
scales below 100 nm is important for many applications
where the production or repair of high resolution and den-
sity features is needed. Laser-based direct-write methods
have the benefit of being able to quickly and easily modify
and create structures on existing devices, but ablation can
negatively impact the overall technique. In this paper we
show that self-positioning of near-field objectives through
the optical trap assisted nanopatterning (OTAN) method al-
lows for ablation without harming the objective elements.
Small microbeads are positioned in close proximity to a sub-
strate where ablation is initiated. Upon ablation, these beads
are temporarily displaced from the trap but rapidly return

  

Source: Arnold, Craig B. - Department of Mechanical and Aerospace Engineering, Princeton University

 

Collections: Engineering; Materials Science