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Defects and their removal in block copolymer thin film simulations

Summary: Defects and their removal in block copolymer
thin film simulations
August W. Bosse
, Scott W. Sides
, Kirill Katsov
Carlos J. Garc´ia-Cervera§
, and Glenn H. Fredrickson¶
April 10, 2006
In recent years, there has been increased interest in using microphase-
separated block copolymer thin films as submicron/suboptical masks in
next generation semiconductor and magnetic media fabrication. With the
goals of removing metastable defects in block copolymer thin film simula-
tions and potentially examining equilibrium defect populations, we report
on two new numerical techniques that can be used in field-theoretic com-
puter simulations: 1) a spectral amplitude filter (SF) which encourages
the simulation to relax into high symmetry states (representing zero de-
fect states), and 2) different variants of forced-biased, partial saddle point
Monte Carlo algorithms that allow for barrier crossing towards lower en-


Source: Akhmedov, Azer - Department of Mathematics, University of California at Santa Barbara


Collections: Mathematics