Home

About

Advanced Search

Browse by Discipline

Scientific Societies

E-print Alerts

Add E-prints

E-print Network
FAQHELPSITE MAPCONTACT US


  Advanced Search  

 
Isolable Photoreactive Polysilyl Radicals Gregory Molev, Boris Tumanskii,* Dennis Sheberla, Mark Botoshansky, Dmitry Bravo-Zhivotovskii,
 

Summary: Isolable Photoreactive Polysilyl Radicals
Gregory Molev, Boris Tumanskii,* Dennis Sheberla, Mark Botoshansky, Dmitry Bravo-Zhivotovskii,
and Yitzhak Apeloig*
Schulich Faculty of Chemistry and the Lise Meitner MinerVa Center for Computational Quantum Chemistry,
Technion-Israel Institute of Technology, Haifa 32000, Israel
Received June 21, 2009; E-mail: tboris@tx.technion.ac.il; apeloig@tx.technion.ac.il
Silyl radicals play an important role in many fields of chemistry.1
For example, in organic synthesis they efficiently abstract halogen
atoms from organic halides,1g
they are used as catalysts in
cyclotrimerization of acetylenes,1h
etc.1
Silyl radicals are also
intermediates in the synthesis and photodegradation of polysilanes,
an important class of polymers.2
Similarly to polysilanes,2c-g
polysilyl radicals may also be photoreactive,3
but their photoreac-
tivity was not studied because isolable silyl radicals were not
available until 2002, when (t-Bu2MeSi)3Si·, the first isolable silyl

  

Source: Apeloig, Yitzhak - Department of Chemistry, Technion, Israel Institute of Technology

 

Collections: Chemistry