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Journal of Magnetism and Magnetic Materials 260 (2003) 5359 Effects of in situ magnetic field application and post-deposition
 

Summary: Journal of Magnetism and Magnetic Materials 260 (2003) 5359
Effects of in situ magnetic field application and post-deposition
magnetic annealing on sputtered Fe50Mn50/Ni80Fe20 bilayers
V. Ng*, F.H. Chen, A.O. Adeyeye
Information Storage Materials Laboratory, Department of Electrical and Computer Engineering,
National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore
Received 16 April 2002; received in revised form 13 June 2002
Abstract
Effects of in situ magnetic field deposition and post-deposition magnetic annealing on the exchange field and
coercivity of Fe50Mn50(200 (A)/Ni80Fe20 bilayers over a range of 40120 (A Ni80Fe20 thicknesses were investigated. A
large increase in coercivity and exchange field was observed in samples that were annealed at 2301C for 15 min in
vacuum. The structure with 80 (A Ni80Fe20 thickness was found to exhibit maximum exchange field in the range of
thickness investigated. The non-monotonic dependence of exchange bias with ferromagnetic layer thickness suggests the
important role played by the microstructure of the Fe50Mn50 antiferromagnetic AF layer. These phenomena are
discussed in relation to surface roughness, grain sizes, diffusion and magnetic domains.
r 2002 Elsevier Science B.V. All rights reserved.
Keywords: Exchange bias; Magnetic field sputtering; Post-deposition magnetic annealing
1. Introduction
Exchange anisotropy observed by depositing an
antiferromagnetic (AF) layer on a ferromagnetic

  

Source: Adeyeye, Adekunle - Department of Electrical and Computer Engineering, National University of Singapore

 

Collections: Physics; Materials Science