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Ultrafast and direct imprint of nanostructures in silicon
 

Summary: ..............................................................
Ultrafast and direct imprint of
nanostructures in silicon
Stephen Y. Chou*, Chris Keimel & Jian Gu
NanoStructure Laboratory, Department of Electrical Engineering, Princeton
University, Princeton, New Jersey 08544, USA
.............................................................................................................................................................................
The fabrication of micrometre- and nanometre-scale devices in
silicon typically involves lithography and etching. These pro-
cesses are costly and tend to be either limited in their resolution
or slow in their throughput1
. Recent work has demonstrated the
possibility of patterning substrates on the nanometre scale by
`imprinting'2,3
or directed self-assembly4
, although an etching
step is still required to generate the final structures. We have
devised and here demonstrate a rapid technique for patterning
nanostructures in silicon that does not require etching. In our
technique--which we call `laser-assisted direct imprint' (LADI)--

  

Source: Adeyeye, Adekunle - Department of Electrical and Computer Engineering, National University of Singapore
Chou, Stephen Y.- Department of Electrical Engineering, Princeton University

 

Collections: Materials Science; Physics