Home

About

Advanced Search

Browse by Discipline

Scientific Societies

E-print Alerts

Add E-prints

E-print Network
FAQHELPSITE MAPCONTACT US


  Advanced Search  

 
Investigation of the formation of nanostructures on silicon thin films by excimer laser irradiation
 

Summary: Investigation of the formation of nanostructures on silicon
thin films by excimer laser irradiation
J. Eizenkop, D.G. Georgiev, I. Avrutsky, G. Auner, V. Chaudhary1
Department of Electrical and Computer Engineering, Wayne State University, Detroit,
MI 48202
1
Department of Computer Science, Wayne State University, Detroit, MI 48202
juliaei@comcast.net
Abstract. We present a theoretical study and experimental results on the formation of conical
nano-tips on silicon thin films as a result of single-pulse excimer laser irradiation. The
fabricated structures have heights of about 1 m and apical radii of curvature of several tens of
nanometers. An individual cone is formed when a mono-crystalline silicon film on an insulator
substrate is irradiated in air environment with a single 25ns pulse from a KrF excimer laser,
homogenized and shaped to a circular spot with diameter of several micrometers. Atomic force
microscopy was used to study these structures. A simplified analytical model for the formation
of these structures is proposed. We also present computer simulations of heat transfer in Si
films that results from irradiation with a single laser pulse, shaped to a circular spot.
1. Introduction
Recently [1], we reported conditions for controllable, direct laser fabrication of sharp conical tips with
heights of about 1 m, base diameter of about 1.5 m and apical radius of curvature of several tens of

  

Source: Avrutsky, Ivan - Department of Electrical and Computer Engineering, Wayne State University
Chaudhary, Vipin - Department of Computer Science and Engineering, State University of New York at Buffalo

 

Collections: Computer Technologies and Information Sciences; Engineering