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Deposition of WNxCy thin films for diffusion barrier application using the dimethylhydrazido (2-
 

Summary: Deposition of WNxCy thin films for diffusion barrier application using the
dimethylhydrazido (2-
) tungsten complex (CH3CN)Cl4W(NNMe2)
Hiral M. Ajmera a
, Timothy J. Anderson a,
, Jürgen Koller b
, Lisa McElwee-White b,
, David P. Norton c
a
Department of Chemical Engineering, University of Florida, Gainesville, FL 32611, USA
b
Department of Chemistry, University of Florida, Gainesville, FL 32611, USA
c
Department of Materials Science and Engineering, University of Florida, Gainesville, FL 32611, USA
a b s t r a c ta r t i c l e i n f o
Article history:
Received 18 June 2008
Received in revised form 13 April 2009
Accepted 13 April 2009
Available online xxxx

  

Source: Anderson, Timothy J. - Chemical Engineering Department, University of Florida

 

Collections: Materials Science