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Development of Agile Titania Sensors Via High-Temperature Reductive Etching Process (HiTREPr

Summary: Development of Agile Titania Sensors Via High-
Temperature Reductive Etching Process (HiTREPr
I. Structural Reorganization
Abdul-Majeed Azad*
Department of Chemical Engineering (MS 305), The University of Toledo, Toledo, Ohio 43606
Shawn Dolan
Henkel Corporation, 32100 Stephenson Highway, Madison Heights, Michigan 48071
Sheikh A. Akbar
Department of Materials Science and Engineering, The Ohio State University, Columbus, Ohio 43210
High selectivity, enhanced sensitivity, short response times and long shelf-life are much sought-after features in solid-state
chemical sensors for the detection and metering of gas(es) of interest. Because the sensing mechanism of semiconducting oxides is
invariably surface dominated, benign microscopic features are desirable to realize a useful sensing material. In principle, such mor-
phological features could be incorporated in a number of semiconducting oxides by employing a technique based on thermody-
namic consideration of the metal/metal oxide coexistence. By dynamically modulating the equilibrium oxygen partial pressure across
the metal/metal oxide proximity line, renewed formulation and growth of an oxide surface on an atomic/submolecular level with
exotic morphological features under conditions of oxygen ``deprivation'' or ``enrichment'' has been achieved practically in a
number of potential ceramic sensor systems. In the case of oxides that are not amenable to such classical oxygen partial pressure
modulation, a novel high-temperature reductive etching process (HiTREPr
) could be exploited to recreate the smart nanofeatures


Source: Azad, Abdul-Majeed - Department of Chemical and Environmental Engineering, University of Toledo


Collections: Materials Science; Energy Storage, Conversion and Utilization