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Simulation and fabrication of microcantilever-based IO grated waveguide sensors for detection of nano-
 

Summary: Simulation and fabrication of microcantilever-based
IO grated waveguide sensors for detection of nano-
displacements
Simulation and fabrication ofSimulation and fabrication of microcantilevermicrocantilever--basedbased
IO grated waveguide sensors for detection ofIO grated waveguide sensors for detection of nanonano--
displacementsdisplacements
Pham Van So1, L.J. Kauppinen1, H.J.W.M. Hoekstra1, M. Dijkstra1, H.A.G.M. van Wolferen1, G.J.M. Krijnen2 and R.M. de Ridder1
1Integrated Optical MicroSystems, 2Transducers Science and Technology, MESA+ Research Institute for Nanotechnology, University of Twente,
7500 AE Enschede, The Netherlands, Email: s.v.pham@ewi.utwente.nl
Fabricated devicesFabricated devices
IntroductionIntroduction
SiO2
Modeling results of the sensorModeling results of the sensor
- Novel integrated read-out scheme to detect small deflections of a cantilever is proposed
- Primary tests of technology were carried out
- Integrated devices with low initial bending of cantilevers have been fabricated
- Optical characterization and sensing measurents are ongoing
ConclusionsConclusions
Dry etching vs. Wet etchingDry etching vs. Wet etching
Process flow chartProcess flow chart

  

Source: Al Hanbali, Ahmad - Department of Applied Mathematics, Universiteit Twente

 

Collections: Engineering