Bibliographic Citation
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| DOI | 10.1103/PhysRevB.68.045419 |
| Title | Quantization condition of quantum-well states in Cu/Co(001) |
| Creator/Author | An, J.M. ; Raczkowski, D. ; Wu, Y.Z. ; Won, C.Y. ; Wang, L.W. ; Canning, A. ; Van Hove, M.A. ; Rotenberg, E. ; Qiu, Z.Q. |
| Publication Date | 2003 Apr 15 |
| OSTI Identifier | OSTI ID: 822835 |
| Report Number(s) | LBNL--52491 |
| DOE Contract Number | AC03-76SF00098 |
| Other Number(s) | Journal ID: ISSN 0163-1829; R&D Project: AJ03MV; TRN: US200414%%304 |
| Resource Type | Journal Article |
| Resource Relation | Journal Name: Physical Review, B: Condensed Matter; Journal Volume: 68; Other Information: Journal Publication Date: 2003; PBD: 15 Apr 2003 |
| Research Org | Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US) |
| Sponsoring Org | USDOE Director, Office of Science. Office of Basic Energy Sciences. Materials Science and Engineering Division; National Science Foundation (US) |
| Subject | 36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; PHOTOEMISSION; QUANTIZATION; REFLECTION; SUBSTRATES; THICKNESS |
| Related Subject | QUANTUM WELL STATES AB INITIO CALCULATIONS PHOTOEMISSION |
| Description/Abstract | Recent photoemission data exhibit individual quantum well states (QWS) at integer numbers (1 to 20) of monolayers in a Cu(001) film grown on a Co(001) substrate film, itself grown pseudomorphically on Cu(001). Ab initio calculations confirm the concept of the quantization condition inherent in the Phase Accumulation Model (PAM) to predict the energies of QWS as a function of their thickness, and provide new insight into their nature. In addition, it is shown that band structures and reflection phases obtained from either experiment or ab initio theory can quantitatively predict QWS energies within the PAM model. It is shown that a simple superposition of oppositely traveling Bloch states, phase-shifted by the reflections from surface and interface, gives an excellent representation of the QWS within the ultrathin film. We point out an improvement to the standard LDA to better represent the image potential of the free surface and its influence on QWS. It is also shown that QWS are tolerant of interdiffusion across the Co/Cu interface, which may broaden the photoemission peaks characteristic of QWS. |
| Country of Publication | United States |
| Language | English |
| Format | Medium: X; Size: vp. |
| System Entry Date | 2008 Sep 11 |
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Last Updated: 11/19/2009