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DOI http://dx.doi.org/10.1002/aic.690410903
Title Wave model for longitudinal dispersion: Analysis and applications
Creator/Author Westerterp, K.R. ; Dil`man, V.V. ; Kronberg, A.E. ; Benneker, A.H. [Twente Univ. of Technology, Enschede (Netherlands)]
Publication Date1995 Sep 01
OSTI IdentifierOSTI ID: 118813
Other Number(s)Journal ID: AICEAC; ISSN 0001-1541; TRN: TRN: IM9546%%214
Resource TypeJournal Article
Resource RelationJournal Name: AIChE Journal; Journal Volume: 41; Journal Issue: 9; Other Information: PBD: Sep 1995
Subject42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; DISPERSIONS; FLOW MODELS; CHEMICAL REACTORS; FICK LAWS; CONCENTRATION RATIO; FLUID MECHANICS; MULTIPHASE FLOW
Description/AbstractAn analysis and applications of the wave model for longitudinal dispersion are presented. Asymptotic forms of the wave model are considered and analytical solutions of typical linear stationary and nonstationary problems of chemical reactor engineering interest are obtained and compared to those for the Fickian dispersion model. The wave model leads to efficient analytical solutions for linear problems, which in principle differ from the solutions of the Fickian dispersion model; only for slowly varying concentration fields do the solutions of both models approach each other. Spatial and time moments of the concentration distribution are obtained for pulse-dispersion problems; the first three spatial moments of the mean, variance, and skewness have exact, large-time asymptotic forms in the case of Taylor dispersion. Old experiments that could not be explained with the standard dispersion model are reconsidered and explained: the change with time of the variance of a concentration pulse when the flow direction is reversed and the difference in values of the apparent axial dispersion coefficient and the back-mixing coefficient in a rotating disk contactor. The experimental determination of model parameters is discussed.
Country of PublicationUnited States
LanguageEnglish
FormatMedium: X; Size: pp. 2029-2039
System Entry Date2008 Feb 04

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