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Title: Electrode configuration for extreme-UV electrical discharge source

Abstract

It has been demonstrated that debris generation within an electric capillary discharge source, for generating extreme ultraviolet and soft x-ray, is dependent on the magnitude and profile of the electric field that is established along the surfaces of the electrodes. An electrode shape that results in uniform electric field strength along its surface has been developed to minimize sputtering and debris generation. The electric discharge plasma source includes: (a) a body that defines a circular capillary bore that has a proximal end and a distal end; (b) a back electrode positioned around and adjacent to the distal end of the capillary bore wherein the back electrode has a channel that is in communication with the distal end and that is defined by a non-uniform inner surface which exhibits a first region which is convex, a second region which is concave, and a third region which is convex wherein the regions are viewed outwardly from the inner surface of the channel that is adjacent the distal end of the capillary bore so that the first region is closest to the distal end; (c) a front electrode positioned around and adjacent to the proximal end of the capillary bore wherein the frontmore » electrode has an opening that is communication with the proximal end and that is defined by a non-uniform inner surface which exhibits a first region which is convex, a second region which is substantially linear, and third region which is convex wherein the regions are viewed outwardly from the inner surface of the opening that is adjacent the proximal end of the capillary bore so that the first region is closest to the proximal end; and (d) a source of electric potential that is connected across the front and back electrodes.

Inventors:
 [1];  [2];  [3]
+ Show Inventor Affiliations
  1. Pleasanton, CA
  2. Tracey, CA
  3. San Ramon, CA
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
OSTI Identifier:
874964
Patent Number(s):
6498832
Assignee:
EUV LLC (Santa Clara, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
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DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
electrode; configuration; extreme-uv; electrical; discharge; source; demonstrated; debris; generation; electric; capillary; generating; extreme; ultraviolet; soft; x-ray; dependent; magnitude; profile; field; established; surfaces; electrodes; shape; results; uniform; strength; surface; developed; minimize; sputtering; plasma; defines; circular; bore; proximal; distal; positioned; adjacent; channel; communication; defined; non-uniform; inner; exhibits; region; convex; concave; third; regions; viewed; outwardly; closest; front; substantially; linear; potential; connected; electric field; extreme ultraviolet; discharge plasma; electrode configuration; /378/250/372/

Citation Formats

Spence, Paul Andrew, Fornaciari, Neal Robert, and Chang, Jim Jihchyun. Electrode configuration for extreme-UV electrical discharge source. United States: N. p., 2002. Web.
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Spence, Paul Andrew, Fornaciari, Neal Robert, & Chang, Jim Jihchyun. Electrode configuration for extreme-UV electrical discharge source. United States.
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Spence, Paul Andrew, Fornaciari, Neal Robert, and Chang, Jim Jihchyun. Tue . "Electrode configuration for extreme-UV electrical discharge source". United States. https://www.osti.gov/servlets/purl/874964.
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@article{osti_874964,
title = {Electrode configuration for extreme-UV electrical discharge source},
author = {Spence, Paul Andrew and Fornaciari, Neal Robert and Chang, Jim Jihchyun},
abstractNote = {It has been demonstrated that debris generation within an electric capillary discharge source, for generating extreme ultraviolet and soft x-ray, is dependent on the magnitude and profile of the electric field that is established along the surfaces of the electrodes. An electrode shape that results in uniform electric field strength along its surface has been developed to minimize sputtering and debris generation. The electric discharge plasma source includes: (a) a body that defines a circular capillary bore that has a proximal end and a distal end; (b) a back electrode positioned around and adjacent to the distal end of the capillary bore wherein the back electrode has a channel that is in communication with the distal end and that is defined by a non-uniform inner surface which exhibits a first region which is convex, a second region which is concave, and a third region which is convex wherein the regions are viewed outwardly from the inner surface of the channel that is adjacent the distal end of the capillary bore so that the first region is closest to the distal end; (c) a front electrode positioned around and adjacent to the proximal end of the capillary bore wherein the front electrode has an opening that is communication with the proximal end and that is defined by a non-uniform inner surface which exhibits a first region which is convex, a second region which is substantially linear, and third region which is convex wherein the regions are viewed outwardly from the inner surface of the opening that is adjacent the proximal end of the capillary bore so that the first region is closest to the proximal end; and (d) a source of electric potential that is connected across the front and back electrodes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 2002},
month = {Tue Jan 01 00:00:00 EST 2002}
}
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Works referenced in this record:

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region
journal, January 1998

Structure and low-temperature thermal conductivity of pyrolytic boron nitride
journal, August 1992

Compression Annealing of Pyrolytic Boron Nitride
journal, March 1969

High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography
conference, June 1999

High-power extreme-ultraviolet source based on gas jets
conference, June 1998

  • Kubiak, Glenn D.; Bernardez II, Luis J.; Krenz, Kevin D.
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309560

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography
conference, June 1998

Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography
journal, January 1997

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