3-D photo-patterning of refractive index structures in photosensitive thin film materials
Abstract
A method of making a three-dimensional refractive index structure in a photosensitive material using photo-patterning. The wavelengths at which a photosensitive material exhibits a change in refractive index upon exposure to optical radiation is first determined and then a portion of the surface of the photosensitive material is optically irradiated at a wavelength at which the photosensitive material exhibits a change in refractive index using a designed illumination system to produce a three-dimensional refractive index structure. The illumination system can be a micro-lenslet array, a macroscopic refractive lens array, or a binary optic phase mask. The method is a single-step, direct-write procedure to produce a designed refractive index structure.
- Inventors:
-
- (Albuquerque, NM)
- Albuquerque, NM
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 874333
- Patent Number(s):
- 6368775
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 3-d; photo-patterning; refractive; index; structures; photosensitive; film; materials; method; three-dimensional; structure; material; wavelengths; exhibits; change; exposure; optical; radiation; determined; portion; surface; optically; irradiated; wavelength; designed; illumination; produce; micro-lenslet; array; macroscopic; lens; binary; optic; phase; mask; single-step; direct-write; procedure; refractive index; film material; sensitive material; photosensitive material; /430/385/
Citation Formats
Potter, Jr., Barrett George, and Potter, Kelly Simmons. 3-D photo-patterning of refractive index structures in photosensitive thin film materials. United States: N. p., 2002.
Web.
Potter, Jr., Barrett George, & Potter, Kelly Simmons. 3-D photo-patterning of refractive index structures in photosensitive thin film materials. United States.
Potter, Jr., Barrett George, and Potter, Kelly Simmons. Tue .
"3-D photo-patterning of refractive index structures in photosensitive thin film materials". United States. https://www.osti.gov/servlets/purl/874333.
@article{osti_874333,
title = {3-D photo-patterning of refractive index structures in photosensitive thin film materials},
author = {Potter, Jr., Barrett George and Potter, Kelly Simmons},
abstractNote = {A method of making a three-dimensional refractive index structure in a photosensitive material using photo-patterning. The wavelengths at which a photosensitive material exhibits a change in refractive index upon exposure to optical radiation is first determined and then a portion of the surface of the photosensitive material is optically irradiated at a wavelength at which the photosensitive material exhibits a change in refractive index using a designed illumination system to produce a three-dimensional refractive index structure. The illumination system can be a micro-lenslet array, a macroscopic refractive lens array, or a binary optic phase mask. The method is a single-step, direct-write procedure to produce a designed refractive index structure.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 2002},
month = {Tue Jan 01 00:00:00 EST 2002}
}
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Works referenced in this record:
One-step 3D shaping using a gray-tone mask for optical and microelectronic applications
journal, January 1994
- Oppliger, Y.; Sixt, P.; Stauffer, J. M.
- Microelectronic Engineering, Vol. 23, Issue 1-4