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Title: Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom

Abstract

A method of manufacturing a flexible metallic photonic band gap structure operable in the infrared region, comprises the steps of spinning on a first layer of dielectric on a GaAs substrate, imidizing this first layer of dielectric, forming a first metal pattern on this first layer of dielectric, spinning on and imidizing a second layer of dielectric, and then removing the GaAs substrate. This method results in a flexible metallic photonic band gap structure operable with various filter characteristics in the infrared region. This method may be used to construct multi-layer flexible metallic photonic band gap structures. Metal grid defects and dielectric separation layer thicknesses are adjusted to control filter parameters.

Inventors:
 [1];  [2];  [2];  [2];  [2]
  1. Bloomington, MN
  2. Ames, IA
Issue Date:
Research Org.:
Ames Laboratory (AMES), Ames, IA; Iowa State Univ., Ames, IA (United States)
OSTI Identifier:
873930
Patent Number(s):
6274293
Application Number:
09/086,790
Assignee:
Iowa State University Research Foundation (Ames, IA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
DOE Contract Number:  
W-7405-ENG-82
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; manufacturing; flexible; metallic; photonic; band; gap; structures; resulting; structure; operable; infrared; region; steps; spinning; layer; dielectric; gaas; substrate; imidizing; forming; metal; pattern; removing; results; filter; characteristics; construct; multi-layer; grid; defects; separation; thicknesses; adjusted; control; parameters; layer thickness; flexible metal; photonic band; infrared region; /430/427/

Citation Formats

Gupta, Sandhya, Tuttle, Gary L, Sigalas, Mihail, McCalmont, Jonathan S, and Ho, Kai-Ming. Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom. United States: N. p., 2001. Web.
Gupta, Sandhya, Tuttle, Gary L, Sigalas, Mihail, McCalmont, Jonathan S, & Ho, Kai-Ming. Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom. United States.
Gupta, Sandhya, Tuttle, Gary L, Sigalas, Mihail, McCalmont, Jonathan S, and Ho, Kai-Ming. Mon . "Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom". United States. https://www.osti.gov/servlets/purl/873930.
@article{osti_873930,
title = {Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom},
author = {Gupta, Sandhya and Tuttle, Gary L and Sigalas, Mihail and McCalmont, Jonathan S and Ho, Kai-Ming},
abstractNote = {A method of manufacturing a flexible metallic photonic band gap structure operable in the infrared region, comprises the steps of spinning on a first layer of dielectric on a GaAs substrate, imidizing this first layer of dielectric, forming a first metal pattern on this first layer of dielectric, spinning on and imidizing a second layer of dielectric, and then removing the GaAs substrate. This method results in a flexible metallic photonic band gap structure operable with various filter characteristics in the infrared region. This method may be used to construct multi-layer flexible metallic photonic band gap structures. Metal grid defects and dielectric separation layer thicknesses are adjusted to control filter parameters.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}

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