Automated control of linear constricted plasma source array
Abstract
An apparatus and method for controlling an array of constricted glow discharge chambers are disclosed. More particularly a linear array of constricted glow plasma sources whose polarity and geometry are set so that the contamination and energy of the ions discharged from the sources are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The quality of film along deposition "tracks" opposite the plasma sources can be measured and compared to desired absolute or relative values by optical and/or electrical sensors. Plasma quality can then be adjusted by adjusting the power current values, gas feed pressure/flow, gas mixtures or a combination of some or all of these to improve the match between the measured values and the desired values.
- Inventors:
-
- Albany, CA
- Martinsville, VA
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 873345
- Patent Number(s):
- 6140773
- Assignee:
- Regents of University of California (Oakland, CA); CRFilms Inc. (Martinsville, VA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- automated; control; linear; constricted; plasma; source; array; apparatus; method; controlling; glow; discharge; chambers; disclosed; particularly; sources; polarity; geometry; set; contamination; energy; discharged; minimized; mounted; parallel; series; provide; sustained; ultra; below; practical; detection; limits; quality; film; deposition; tracks; opposite; measured; compared; desired; absolute; relative; values; optical; electrical; sensors; adjusted; adjusting; power; current; gas; feed; pressure; flow; mixtures; combination; improve; match; plasma sources; gas feed; constricted glow; linear array; gas mixtures; plasma source; glow discharge; gas mixture; detection limits; discharge chamber; desired value; desired values; measured value; automated control; detection limit; current value; /315/204/
Citation Formats
Anders, Andre, and Maschwitz, Peter A. Automated control of linear constricted plasma source array. United States: N. p., 2000.
Web.
Anders, Andre, & Maschwitz, Peter A. Automated control of linear constricted plasma source array. United States.
Anders, Andre, and Maschwitz, Peter A. Sat .
"Automated control of linear constricted plasma source array". United States. https://www.osti.gov/servlets/purl/873345.
@article{osti_873345,
title = {Automated control of linear constricted plasma source array},
author = {Anders, Andre and Maschwitz, Peter A},
abstractNote = {An apparatus and method for controlling an array of constricted glow discharge chambers are disclosed. More particularly a linear array of constricted glow plasma sources whose polarity and geometry are set so that the contamination and energy of the ions discharged from the sources are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The quality of film along deposition "tracks" opposite the plasma sources can be measured and compared to desired absolute or relative values by optical and/or electrical sensors. Plasma quality can then be adjusted by adjusting the power current values, gas feed pressure/flow, gas mixtures or a combination of some or all of these to improve the match between the measured values and the desired values.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}
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