Method of drying passivated micromachines by dewetting from a liquid-based process
Abstract
A method of fabricating a micromachine includes the step of constructing a low surface energy film on the micromachine. The micromachine is then rinsed with a rinse liquid that has a high surface energy, relative to the low surface energy film, to produce a contact angle of greater than 90.degree. between the low surface energy film and the rinse liquid. This relatively large contact angle causes any rinse liquid on the micromachine to be displaced from the micromachine when the micromachine is removed from the rinse liquid. In other words, the micromachine is dried by dewetting from a liquid-based process. Thus, a separate evaporative drying step is not required, as the micromachine is removed from the liquid-based process in a dry state. The relatively large contact angle also operates to prevent attractive capillary forces between micromachine components, thereby preventing contact and adhesion between adjacent microstructure surfaces. The low surface energy film may be constructed with a fluorinated self-assembled monolayer film. The processing of the invention avoids the use of environmentally harmful, health-hazardous chemicals.
- Inventors:
-
- Berkeley, CA
- Lafayette, CA
- Orinda, CA
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 873213
- Patent Number(s):
- 6114044
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81B - MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- method; drying; passivated; micromachines; dewetting; liquid-based; process; fabricating; micromachine; step; constructing; surface; energy; film; rinsed; rinse; liquid; relative; produce; contact; angle; 90; degree; relatively; causes; displaced; removed; words; dried; separate; evaporative; required; dry; operates; prevent; attractive; capillary; forces; components; preventing; adhesion; adjacent; microstructure; surfaces; constructed; fluorinated; self-assembled; monolayer; processing; avoids; environmentally; harmful; health-hazardous; chemicals; surface energy; capillary forces; contact angle; evaporative drying; drying step; monolayer film; self-assembled monolayer; machine components; /428/216/310/427/
Citation Formats
Houston, Michael R, Howe, Roger T, Maboudian, Roya, and Srinivasan, Uthara. Method of drying passivated micromachines by dewetting from a liquid-based process. United States: N. p., 2000.
Web.
Houston, Michael R, Howe, Roger T, Maboudian, Roya, & Srinivasan, Uthara. Method of drying passivated micromachines by dewetting from a liquid-based process. United States.
Houston, Michael R, Howe, Roger T, Maboudian, Roya, and Srinivasan, Uthara. Sat .
"Method of drying passivated micromachines by dewetting from a liquid-based process". United States. https://www.osti.gov/servlets/purl/873213.
@article{osti_873213,
title = {Method of drying passivated micromachines by dewetting from a liquid-based process},
author = {Houston, Michael R and Howe, Roger T and Maboudian, Roya and Srinivasan, Uthara},
abstractNote = {A method of fabricating a micromachine includes the step of constructing a low surface energy film on the micromachine. The micromachine is then rinsed with a rinse liquid that has a high surface energy, relative to the low surface energy film, to produce a contact angle of greater than 90.degree. between the low surface energy film and the rinse liquid. This relatively large contact angle causes any rinse liquid on the micromachine to be displaced from the micromachine when the micromachine is removed from the rinse liquid. In other words, the micromachine is dried by dewetting from a liquid-based process. Thus, a separate evaporative drying step is not required, as the micromachine is removed from the liquid-based process in a dry state. The relatively large contact angle also operates to prevent attractive capillary forces between micromachine components, thereby preventing contact and adhesion between adjacent microstructure surfaces. The low surface energy film may be constructed with a fluorinated self-assembled monolayer film. The processing of the invention avoids the use of environmentally harmful, health-hazardous chemicals.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}