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Title: Low work function, stable compound clusters and generation process

Abstract

Low work function, stable compound clusters are generated by co-evaporation of a solid semiconductor (i.e., Si) and alkali metal (i.e., Cs) elements in an oxygen environment. The compound clusters are easily patterned during deposition on substrate surfaces using a conventional photo-resist technique. The cluster size distribution is narrow, with a peak range of angstroms to nanometers depending on the oxygen pressure and the Si source temperature. Tests have shown that compound clusters when deposited on a carbon substrate contain the desired low work function property and are stable up to 600.degree. C. Using the patterned cluster containing plate as a cathode baseplate and a faceplate covered with phosphor as an anode, one can apply a positive bias to the faceplate to easily extract electrons and obtain illumination.

Inventors:
 [1];  [2];  [3];  [3];  [4]
  1. Concord, CA
  2. Berkeley, CA
  3. Livermore, CA
  4. (Oakland, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
OSTI Identifier:
872837
Patent Number(s):
6019913
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
function; stable; compound; clusters; generation; process; generated; co-evaporation; solid; semiconductor; alkali; metal; cs; elements; oxygen; environment; easily; patterned; deposition; substrate; surfaces; conventional; photo-resist; technique; cluster; size; distribution; narrow; peak; range; angstroms; nanometers; depending; pressure; source; temperature; tests; shown; deposited; carbon; contain; desired; property; 600; degree; containing; plate; cathode; baseplate; faceplate; covered; phosphor; anode; apply; positive; bias; extract; electrons; obtain; illumination; size distribution; alkali metal; substrate surface; oxygen pressure; stable compound; oxygen environment; substrate surfaces; compound clusters; solid semiconductor; generation process; substrate contain; /252/445/

Citation Formats

Dinh, Long N, Balooch, Mehdi, Schildbach, Marcus A, Hamza, Alex V, and McLean, II, William. Low work function, stable compound clusters and generation process. United States: N. p., 2000. Web.
Dinh, Long N, Balooch, Mehdi, Schildbach, Marcus A, Hamza, Alex V, & McLean, II, William. Low work function, stable compound clusters and generation process. United States.
Dinh, Long N, Balooch, Mehdi, Schildbach, Marcus A, Hamza, Alex V, and McLean, II, William. Sat . "Low work function, stable compound clusters and generation process". United States. https://www.osti.gov/servlets/purl/872837.
@article{osti_872837,
title = {Low work function, stable compound clusters and generation process},
author = {Dinh, Long N and Balooch, Mehdi and Schildbach, Marcus A and Hamza, Alex V and McLean, II, William},
abstractNote = {Low work function, stable compound clusters are generated by co-evaporation of a solid semiconductor (i.e., Si) and alkali metal (i.e., Cs) elements in an oxygen environment. The compound clusters are easily patterned during deposition on substrate surfaces using a conventional photo-resist technique. The cluster size distribution is narrow, with a peak range of angstroms to nanometers depending on the oxygen pressure and the Si source temperature. Tests have shown that compound clusters when deposited on a carbon substrate contain the desired low work function property and are stable up to 600.degree. C. Using the patterned cluster containing plate as a cathode baseplate and a faceplate covered with phosphor as an anode, one can apply a positive bias to the faceplate to easily extract electrons and obtain illumination.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}