Ringfield lithographic camera
Abstract
A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D.sub.source .apprxeq.0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry with an increased etendue for the camera system. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors.
- Inventors:
-
- Albuquerque, NM
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 871832
- Patent Number(s):
- 5805365
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- ringfield; lithographic; camera; projection; lithography; wide; optimized; efficient; extreme; ultraviolet; radiation; source; apprxeq; comprises; aspheric; mirrors; optically; arranged; common; axis; symmetry; increased; etendue; aperture; stop; accessible; plurality; partial; stops; synthesize; theoretical; mask; focused; form; reduced; image; wafer; relative; reflection; projection lithography; ultraviolet radiation; extreme ultraviolet; radiation source; common axis; camera comprises; lithographic camera; aspheric mirrors; aspheric mirror; lithography camera; /359/378/
Citation Formats
Sweatt, William C. Ringfield lithographic camera. United States: N. p., 1998.
Web.
Sweatt, William C. Ringfield lithographic camera. United States.
Sweatt, William C. Thu .
"Ringfield lithographic camera". United States. https://www.osti.gov/servlets/purl/871832.
@article{osti_871832,
title = {Ringfield lithographic camera},
author = {Sweatt, William C},
abstractNote = {A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D.sub.source .apprxeq.0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry with an increased etendue for the camera system. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 1998},
month = {Thu Jan 01 00:00:00 EST 1998}
}
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