Pulsed ion beam source
Abstract
An improved magnetically-confined anode plasma pulsed ion beam source. Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure and the slow field structure near the anode of the ion beam source, by a gas port design which localizes the gas delivery into the gap between the fast coil and the anode, by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means which optimally adjusts the plasma formation position in the ion beam source.
- Inventors:
-
- Lansing, NY
- Issue Date:
- Research Org.:
- AT&T
- OSTI Identifier:
- 870461
- Patent Number(s):
- 5525805
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS
C - CHEMISTRY C08 - ORGANIC MACROMOLECULAR COMPOUNDS C08J - WORKING-UP
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- pulsed; beam; source; improved; magnetically-confined; anode; plasma; rotation; effects; power; efficiency; magnetic; design; separatrix; fast; field; flux; structure; slow; near; gas; localizes; delivery; gap; coil; pre-ionizer; ringing; circuit; connected; bias; means; optimally; adjusts; formation; position; circuit connected; beam source; gas delivery; field flux; bias field; power efficiency; plasma formation; field means; improved magnetic; fast coil; /250/315/
Citation Formats
Greenly, John B. Pulsed ion beam source. United States: N. p., 1996.
Web.
Greenly, John B. Pulsed ion beam source. United States.
Greenly, John B. Mon .
"Pulsed ion beam source". United States. https://www.osti.gov/servlets/purl/870461.
@article{osti_870461,
title = {Pulsed ion beam source},
author = {Greenly, John B},
abstractNote = {An improved magnetically-confined anode plasma pulsed ion beam source. Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure and the slow field structure near the anode of the ion beam source, by a gas port design which localizes the gas delivery into the gap between the fast coil and the anode, by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means which optimally adjusts the plasma formation position in the ion beam source.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1996},
month = {Mon Jan 01 00:00:00 EST 1996}
}
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