Magnetically attached sputter targets
Abstract
An improved method and assembly for attaching sputtering targets to cathode assemblies of sputtering systems which includes a magnetically permeable material. The magnetically permeable material is imbedded in a target base that is brazed, welded, or soldered to the sputter target, or is mechanically retained in the target material. Target attachment to the cathode is achieved by virtue of the permanent magnets and/or the pole pieces in the cathode assembly that create magnetic flux lines adjacent to the backing plate, which strongly attract the magnetically permeable material in the target assembly.
- Inventors:
-
- Livermore, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 869159
- Patent Number(s):
- 5286361
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- magnetically; attached; sputter; targets; improved; method; assembly; attaching; sputtering; cathode; assemblies; systems; permeable; material; imbedded; target; base; brazed; welded; soldered; mechanically; retained; attachment; achieved; virtue; permanent; magnets; pole; pieces; create; magnetic; flux; lines; adjacent; plate; strongly; attract; permeable material; magnetically permeable; sputtering targets; pole pieces; improved method; magnetic flux; permanent magnet; permanent magnets; target material; sputter target; cathode assembly; target assembly; sputter targets; cathode assemblies; flux line; target mater; pole piece; attached sputter; magnetically attached; /204/
Citation Formats
Makowiecki, Daniel M, and McKernan, Mark A. Magnetically attached sputter targets. United States: N. p., 1994.
Web.
Makowiecki, Daniel M, & McKernan, Mark A. Magnetically attached sputter targets. United States.
Makowiecki, Daniel M, and McKernan, Mark A. Sat .
"Magnetically attached sputter targets". United States. https://www.osti.gov/servlets/purl/869159.
@article{osti_869159,
title = {Magnetically attached sputter targets},
author = {Makowiecki, Daniel M and McKernan, Mark A},
abstractNote = {An improved method and assembly for attaching sputtering targets to cathode assemblies of sputtering systems which includes a magnetically permeable material. The magnetically permeable material is imbedded in a target base that is brazed, welded, or soldered to the sputter target, or is mechanically retained in the target material. Target attachment to the cathode is achieved by virtue of the permanent magnets and/or the pole pieces in the cathode assembly that create magnetic flux lines adjacent to the backing plate, which strongly attract the magnetically permeable material in the target assembly.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 1994},
month = {Sat Jan 01 00:00:00 EST 1994}
}
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