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Title: Axial flow plasma shutter

Abstract

A shutter (36) is provided for controlling a beam, or current, of charged particles in a device such as a thyratron (10). The substrate (38) defines an aperture (60) with a gap (32) which is placeable within the current. Coils (48) are formed on the substrate (38) adjacent the aperture (60) to produce a magnetic field for trapping the charged particles in or about aperture (60). The proximity of the coils (48) to the aperture (60) enables an effective magnetic field to be generated by coils (48) having a low inductance suitable for high frequency control. The substantially monolithic structure including the substrate (38) and coils (48) enables the entire shutter assembly (36) to be effectively located with respect to the particle beam.

Inventors:
 [1]
  1. Fort Collins, CO
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
OSTI Identifier:
866485
Patent Number(s):
4721891
Assignee:
Regents of University of California (Berkeley, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
axial; flow; plasma; shutter; 36; provided; controlling; beam; current; charged; particles; device; thyratron; 10; substrate; 38; defines; aperture; 60; gap; 32; placeable; coils; 48; formed; adjacent; produce; magnetic; field; trapping; proximity; enables; effective; generated; inductance; suitable; frequency; control; substantially; monolithic; structure; including; entire; assembly; effectively; located; respect; particle; monolithic structure; structure including; particle beam; charged particles; magnetic field; charged particle; axial flow; /315/313/

Citation Formats

Krausse, George J. Axial flow plasma shutter. United States: N. p., 1988. Web.
Krausse, George J. Axial flow plasma shutter. United States.
Krausse, George J. Fri . "Axial flow plasma shutter". United States. https://www.osti.gov/servlets/purl/866485.
@article{osti_866485,
title = {Axial flow plasma shutter},
author = {Krausse, George J},
abstractNote = {A shutter (36) is provided for controlling a beam, or current, of charged particles in a device such as a thyratron (10). The substrate (38) defines an aperture (60) with a gap (32) which is placeable within the current. Coils (48) are formed on the substrate (38) adjacent the aperture (60) to produce a magnetic field for trapping the charged particles in or about aperture (60). The proximity of the coils (48) to the aperture (60) enables an effective magnetic field to be generated by coils (48) having a low inductance suitable for high frequency control. The substantially monolithic structure including the substrate (38) and coils (48) enables the entire shutter assembly (36) to be effectively located with respect to the particle beam.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1988},
month = {Fri Jan 01 00:00:00 EST 1988}
}