Poly(silyl silane)homo and copolymers
Abstract
Poly(silyl silanes) have been prepared. They have high photosensitivity and show excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
- Inventors:
- Issue Date:
- OSTI Identifier:
- 7267147
- Patent Number(s):
- 4820788
- Application Number:
- PPN: US 6-925552
- Assignee:
- John M. Zeigler, Albuquerque, NM (United States)
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 31 Oct 1986
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; 42 ENGINEERING; MATERIALS; MASKING; SILANES; CHEMICAL PREPARATION; PHOTOSENSITIVITY; HYDRIDES; HYDROGEN COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; SENSITIVITY; SILICON COMPOUNDS; SYNTHESIS; 400500* - Photochemistry; 426000 - Engineering- Components, Electron Devices & Circuits- (1990-)
Citation Formats
Zeigler, J M. Poly(silyl silane)homo and copolymers. United States: N. p., 1989.
Web.
Zeigler, J M. Poly(silyl silane)homo and copolymers. United States.
Zeigler, J M. Tue .
"Poly(silyl silane)homo and copolymers". United States.
@article{osti_7267147,
title = {Poly(silyl silane)homo and copolymers},
author = {Zeigler, J M},
abstractNote = {Poly(silyl silanes) have been prepared. They have high photosensitivity and show excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 11 00:00:00 EDT 1989},
month = {Tue Apr 11 00:00:00 EDT 1989}
}
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