Large area, surface discharge pumped, vacuum ultraviolet light source
Abstract
Large area, surface discharge pumped, vacuum ultraviolet (VUV) light source is disclosed. A contamination-free VUV light source having a 225 cm{sup 2} emission area in the 240-340 nm region of the electromagnetic spectrum with an average output power in this band of about 2 J/cm{sup 2} at a wall-plug efficiency of approximately 5% is described. Only ceramics and metal parts are employed in this surface discharge source. Because of the contamination-free, high photon energy and flux, and short pulse characteristics of the source, it is suitable for semiconductor and flat panel display material processing. 3 figs.
- Inventors:
- Issue Date:
- Research Org.:
- Univ. of California (United States)
- OSTI Identifier:
- 415764
- Patent Number(s):
- 5585641
- Application Number:
- PAN: 8-448,242
- Assignee:
- Univ. of California, Alameda, CA (United States)
- DOE Contract Number:
- W-7405-ENG-36
- Resource Type:
- Patent
- Resource Relation:
- Other Information: PBD: 17 Dec 1996
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; LIGHT SOURCES; DESIGN; SEMICONDUCTOR MATERIALS; MANUFACTURING; DISPLAY DEVICES; FAR ULTRAVIOLET RADIATION; INDUSTRIAL PLANTS
Citation Formats
Sze, R C, and Quigley, G P. Large area, surface discharge pumped, vacuum ultraviolet light source. United States: N. p., 1996.
Web.
Sze, R C, & Quigley, G P. Large area, surface discharge pumped, vacuum ultraviolet light source. United States.
Sze, R C, and Quigley, G P. Tue .
"Large area, surface discharge pumped, vacuum ultraviolet light source". United States.
@article{osti_415764,
title = {Large area, surface discharge pumped, vacuum ultraviolet light source},
author = {Sze, R C and Quigley, G P},
abstractNote = {Large area, surface discharge pumped, vacuum ultraviolet (VUV) light source is disclosed. A contamination-free VUV light source having a 225 cm{sup 2} emission area in the 240-340 nm region of the electromagnetic spectrum with an average output power in this band of about 2 J/cm{sup 2} at a wall-plug efficiency of approximately 5% is described. Only ceramics and metal parts are employed in this surface discharge source. Because of the contamination-free, high photon energy and flux, and short pulse characteristics of the source, it is suitable for semiconductor and flat panel display material processing. 3 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 17 00:00:00 EST 1996},
month = {Tue Dec 17 00:00:00 EST 1996}
}
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