Apparatus for externally controlled closed-loop feedback digital epitaxy
Abstract
A method and apparatus for digital epitaxy are disclosed. The apparatus includes a pulsed gas delivery assembly that supplies gaseous material to a substrate to form an adsorption layer of the gaseous material on the substrate. Structure is provided for measuring the isothermal desorption spectrum of the growth surface to monitor the active sites which are available for adsorption. The vacuum chamber housing the substrate facilitates evacuation of the gaseous material from the area adjacent the substrate following exposure. In use, digital epitaxy is achieved by exposing a substrate to a pulse of gaseous material to form an adsorption layer of the material on the substrate. The active sites on the substrate are monitored during the formation of the adsorption layer to determine if all the active sites have been filled. Once the active sites have been filled on the growth surface of the substrate, the pulse of gaseous material is terminated. The unreacted portion of the gas pulse is evacuated by continuous pumping. Subsequently, a second pulse is applied when availability of active sites is determined by studying the isothermal desorption spectrum. These steps are repeated until a thin film of sufficient thickness is produced. 5 figs.
- Inventors:
- Issue Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- OSTI Identifier:
- 264567
- Patent Number(s):
- 5540783
- Application Number:
- PAN: 8-249,597
- Assignee:
- Martin Marietta Energy Systems, Inc., Oak Ridge, TN (United States)
- DOE Contract Number:
- AC05-84OR21400
- Resource Type:
- Patent
- Resource Relation:
- Other Information: PBD: 30 Jul 1996
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; MATERIALS; VAPOR PHASE EPITAXY; PROCESS CONTROL; MATERIALS HANDLING EQUIPMENT; DESIGN; DIGITAL SYSTEMS; VACUUM SYSTEMS
Citation Formats
Eres, D, and Sharp, J W. Apparatus for externally controlled closed-loop feedback digital epitaxy. United States: N. p., 1996.
Web.
Eres, D, & Sharp, J W. Apparatus for externally controlled closed-loop feedback digital epitaxy. United States.
Eres, D, and Sharp, J W. Tue .
"Apparatus for externally controlled closed-loop feedback digital epitaxy". United States.
@article{osti_264567,
title = {Apparatus for externally controlled closed-loop feedback digital epitaxy},
author = {Eres, D and Sharp, J W},
abstractNote = {A method and apparatus for digital epitaxy are disclosed. The apparatus includes a pulsed gas delivery assembly that supplies gaseous material to a substrate to form an adsorption layer of the gaseous material on the substrate. Structure is provided for measuring the isothermal desorption spectrum of the growth surface to monitor the active sites which are available for adsorption. The vacuum chamber housing the substrate facilitates evacuation of the gaseous material from the area adjacent the substrate following exposure. In use, digital epitaxy is achieved by exposing a substrate to a pulse of gaseous material to form an adsorption layer of the material on the substrate. The active sites on the substrate are monitored during the formation of the adsorption layer to determine if all the active sites have been filled. Once the active sites have been filled on the growth surface of the substrate, the pulse of gaseous material is terminated. The unreacted portion of the gas pulse is evacuated by continuous pumping. Subsequently, a second pulse is applied when availability of active sites is determined by studying the isothermal desorption spectrum. These steps are repeated until a thin film of sufficient thickness is produced. 5 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 30 00:00:00 EDT 1996},
month = {Tue Jul 30 00:00:00 EDT 1996}
}