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Title: Process for applying control variables having fractal structures

Abstract

A process and apparatus are disclosed for the application of a control variable having a fractal structure to a body or process. The process of the present invention comprises the steps of generating a control variable having a fractal structure and applying the control variable to a body or process reacting in accordance with the control variable. The process is applicable to electroforming where first, second and successive pulsed-currents are applied to cause the deposition of material onto a substrate, such that the first pulsed-current, the second pulsed-current, and successive pulsed currents form a fractal pulsed-current waveform. 3 figs.

Inventors:
;
Issue Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
OSTI Identifier:
187082
Patent Number(s):
5486280
Application Number:
PAN: 8-326,425
Assignee:
Martin Marietta Energy Systems, Inc., Oak Ridge, TN (United States)
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 23 Jan 1996
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; MATERIALS; ELECTRODEPOSITION; PROCESS CONTROL; FRACTALS; CONTROL THEORY; CONTROL EQUIPMENT

Citation Formats

Bullock, IV, J S, and Lawson, R L. Process for applying control variables having fractal structures. United States: N. p., 1996. Web.
Bullock, IV, J S, & Lawson, R L. Process for applying control variables having fractal structures. United States.
Bullock, IV, J S, and Lawson, R L. Tue . "Process for applying control variables having fractal structures". United States.
@article{osti_187082,
title = {Process for applying control variables having fractal structures},
author = {Bullock, IV, J S and Lawson, R L},
abstractNote = {A process and apparatus are disclosed for the application of a control variable having a fractal structure to a body or process. The process of the present invention comprises the steps of generating a control variable having a fractal structure and applying the control variable to a body or process reacting in accordance with the control variable. The process is applicable to electroforming where first, second and successive pulsed-currents are applied to cause the deposition of material onto a substrate, such that the first pulsed-current, the second pulsed-current, and successive pulsed currents form a fractal pulsed-current waveform. 3 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 23 00:00:00 EST 1996},
month = {Tue Jan 23 00:00:00 EST 1996}
}

Patent:
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