Photosensitive dissolution inhibitors and resists based on onium salt carboxylates
Abstract
A photoresist composition that employs onium salt carboxylates as thermally stable dissolution inhibitors. The photoresist composition can be either an onium carboxylate salt with a phenolic photoresist, such as novolac, or an onium cation protected carboxylate-containing resin such as an acrylic/acrylic acid copolymer. The onium carboxylate can be an onium cholate, wherein the onium cholate is an iodonium cholate. Particularly preferred iodonium cholates are alkyloxyphenylphenyl iodonium cholates and most particularly preferred is octyloxyphenyphenyl iodonium cholate. The photoresist composition will not create nitrogen or other gaseous byproducts upon exposure to radiation, does not require water for photoactivation, has acceptable UV radiation transmission characteristics, and is thermally stable at temperatures required for solvent removal.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1175562
- Patent Number(s):
- 6969576
- Application Number:
- 10/000,429
- Assignee:
- Sandia National Laboratories
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Citation Formats
Dentinger, Paul M., and Simison, Kelby L. Photosensitive dissolution inhibitors and resists based on onium salt carboxylates. United States: N. p., 2005.
Web.
Dentinger, Paul M., & Simison, Kelby L. Photosensitive dissolution inhibitors and resists based on onium salt carboxylates. United States.
Dentinger, Paul M., and Simison, Kelby L. Tue .
"Photosensitive dissolution inhibitors and resists based on onium salt carboxylates". United States. https://www.osti.gov/servlets/purl/1175562.
@article{osti_1175562,
title = {Photosensitive dissolution inhibitors and resists based on onium salt carboxylates},
author = {Dentinger, Paul M. and Simison, Kelby L.},
abstractNote = {A photoresist composition that employs onium salt carboxylates as thermally stable dissolution inhibitors. The photoresist composition can be either an onium carboxylate salt with a phenolic photoresist, such as novolac, or an onium cation protected carboxylate-containing resin such as an acrylic/acrylic acid copolymer. The onium carboxylate can be an onium cholate, wherein the onium cholate is an iodonium cholate. Particularly preferred iodonium cholates are alkyloxyphenylphenyl iodonium cholates and most particularly preferred is octyloxyphenyphenyl iodonium cholate. The photoresist composition will not create nitrogen or other gaseous byproducts upon exposure to radiation, does not require water for photoactivation, has acceptable UV radiation transmission characteristics, and is thermally stable at temperatures required for solvent removal.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 29 00:00:00 EST 2005},
month = {Tue Nov 29 00:00:00 EST 2005}
}